Semiconductor plasma analysis software 'Particle-PLUS'
"Particle-PLUS" is a plasma and rarefied fluid analysis software that excels in ICP and CCP analysis using particle methods.
"Particle-PLUS" is software suitable for research and development of devices using plasma, compatible with ICP and CCP. - Excels in simulations of low-pressure gases where fluid modeling is challenging. - Calculation functions for inductive heating for ICP simulations. - Advanced physical model analysis such as CCP and external circuit models. - Capable of simultaneously simulating ICP and CCP. - Supports 2D and 3D, efficiently analyzing even complex models. - As a strength of our in-house developed software, customization to fit customer devices is possible. ◆ Supports various cases ◆ - Magnetron sputtering - PVD, plasma CVD - Capacitively coupled plasma (CCP) - Dielectric barrier discharge (DBD), etc. ◆ Outputs various calculation results ◆ - Potential distribution - Density distribution/temperature distribution/generation distribution of electrons and ions - Particle flux and energy flux to the wall - Energy spectrum of electrons and ions at the wall - Density distribution/temperature distribution/velocity distribution of neutral gas, etc. *For more details, please feel free to contact us at sales@wavefront.co.jp.
- Company：ウェーブフロント 本社
- Price：Other
